Ipc g03f

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August undefined, 2024

WebCPC Scheme - G03F PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF … http://www.jiii.or.jp/chizaiyorozuya/pdf/toukei/krp2024032731.pdf

SECTION G — SECTION G --- PHYSICS

Web12 aug. 2024 · 1.一种光刻胶的图案化方法，包括以下步骤：将所述光刻胶涂布在基底表面，除去所述光刻胶中的有机溶剂，在所述基底表面上形成预成膜层，所述光刻胶包括有机溶剂、功能粒子5～25份、自由基淬灭剂0～2份且不为0份，所述功能粒子包括可自由基聚合型金属氧化物以及包被在所述金属氧化物表面的 ... Webg03f section g — physics g03 photography; cinematography; analogous techniques using waves other than optical waves; electrography; holography g03f photomechanical … radice 56

Cyclical scanning of exposure machine - TW202401133A - 专利顾如

Web技術分野は各案件の筆頭IPCを集計しています。出願人件数うち筆頭件数サムスン電子 184 184 サムスンディスプレイ 64 63 LG化学 62 62 LG Energy Solution, LTD. 50 50 現 … Web11 sep. 2024 · International Filing Date 09.11.2024 IPC G03F 7/20 G03F 9/00 Title A METHOD FOR MODELING MEASUREMENT DATA OVER A SUBSTRATE AREA AND ASSOCIATED APPARATUSES Abstract Disclosed is a method for modeling measurement data over a substrate area relating to a substrate in a lithographic process. Web12 mei 2013 · International Filing Date 31.05.2013 IPC G03F 7/004 C08F 212/02 G03F 7/039 H01L 21/027 Title ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM AND PATTERN FORMING METHOD USING THE SAME, MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE, AND … download java plugin java 1.5.0

Shearing interferometer for euv wavefront measurement

Ipc g03f

[특허]Pattern Height Metrology Using an E-Beam System

Web8 apr. 2024 · 本发明涉及一种用作光刻胶的感光树脂组合物，特别涉及一种用于光刻胶的感光树脂组合物，该组合物以聚倍半硅氧烷类共聚物为成膜树脂，以二叠氮化物为感光剂， … Web588737172 - EP 3363843 B1 20240412 - RESIN AND PHOTOSENSITIVE RESIN COMPOSITION - [origin: EP3363843A1] A resin and a photosensitive resin composition …

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WebPHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES (for photomechanical purposes G03F); PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, …

Web技術分野は各案件の筆頭IPCを集計しています。出願人件数うち筆頭件数サムスン電子 85 85 Apple Inc. 53 53 LGエレクトロニクス 43 43 サムスンディスプレイ 32 32 現代自 … Web5 dec. 2024 · In accordance with some embodiments of the present disclosure, an inspection method of a photomask includes performing a first inspection process, …

Web296611042 - EP 0843221 B1 20040506 - Projection exposure apparatus - [origin: EP0843221A2] The projection exposure apparatus is provided with a moving mirror … Web588740495 - EP 4163721 A1 20240412 - CHAMBER FOR A PROJECTION SYSTEM OF A LITHOGRAPHIC APPARATUS, PROJECTION SYSTEM AND LITHOGRAPHIC …

WebInformation provided on ipc code assigned before grant: Ipc: G02B 5/18 20060101ALI20060721BHEP. Ipc: G01M 11/02 20060101ALI20060721BHEP. Ipc: …

WebIpc: G03F0007039000. 2011-10-14: GRAP: Despatch of communication of intention to grant a patent: Free format text: ORIGINAL CODE: EPIDOSNIGR1. 2011-11-02: RIC1: … radice 654Web列表数据仅在虚线下方。全文数据即将推出。 download java runtime 64 bitsWebG03F 1/00 : フォトメカニカル法による凹凸化又はパターン化された表面の製造に用いる原稿の作成[3]. G03F 1/02 : ・レリーフ状原稿作成に写真方法を用いるもの. G03F 1/04 : … radice 6400WebIPC 8 full level G03F 7/20 (2006.01) CPC (source: EP KR US) G03F 7/704 (2013.01 - KR); G03F 7/70458 (2013.01 - EP KR US); G03F 7/705 (2013.01 - EP KR US); G03F 7/70516 … download java runtime 8Web20 jun. 2024 · IPC G03F 7/20 Title OVERLAYING ON LOCALLY DISPOSITIONED PATTERNS BY ML BASED DYNAMIC DIGITAL CORRECTIONS (ML-DDC) Abstract Systems and methods disclosed are generally related to masklessly developing connections between a chip-group and a design connection point on a substrate. download java runtime 7 32 bitWebClassification of the application (IPC): G03F 7/20, G03F 1/72, G03F 1/36, G03F 1/70, H01J 37/32 Technical fields searched (IPC): G03F, H01J DOCUMENTS CONSIDERED TO … radice 6543Web1 feb. 2024 · 1.一种LDI光刻胶专用环氧丙烯酸树脂的组合物的制造装置，其特征在于，该LDI光刻胶专用环氧丙烯酸树脂的组合物由以下重量份数的成分组成：丙烯酸双环戊二烯基氧乙酯38‑48份，聚氨酯改性环氧丙烯酸树脂15‑25份，三芳基硅氧醚0.5‑0.7份，活性增感助剂 radice 6